応用機械工学ジャーナル

概要

Stress Fields Induced by Dislocation Loops in Isotropic CuNb Film- Substrate System

Wu W, Qian G and Cui X

Based on linear superposition rules and fast discrete Fourier transformation, a semi-analytical solution is developed for calculating the elastic fields induced by dislocation loops in an isotropic thin film-substrate system. The elastic field problem of thin film-substrate system is decomposed into two sub-problems: bulk stress due to a dislocation loop in an infinite space, and correction stress induced by free surface and interface of the film-substrate system. Correction elastic field is linearly superimposed onto bulk elastic field to produce continuous displacement and traction stress across the interface plane of the perfectly-bounded film-substrate system. Firstly, calculation examples of dislocation loops in Cu-Nb film-substrate system are performed to demonstrate the calculation efficiency of the developed semi-analytical approach. Then, elastic fields of dislocation loops within Cu film and Nb substrate of the Cu-Nb film-substrate system are analyzed. Finally, effects of film thickness, loop positions are investigated, and it is found that the elastic fields of dislocation loop are influenced remarkably by these two factors.